1b. ACI: X-Ray Spectroscopy\Microscopy: ACI: ULVAC-PHI, XPS, PHI GENESIS 900

What is it?

X-ray photoelectron spectroscopy (XPS) is a surface-sensitive technique used to analyze the elemental composition and chemical state of materials.

Manufacturer

ULVAC-PHI

Model Name

PHI GENESIS 900

Applications

The XPS application areas include: • Catalysis: investigation of catalyst surfaces and active sites to understand reaction mechanisms and improve catalytic performance • Material Science: Characterization of surface chemistry, composition, and electronic properties • Semiconductor: Analysis of thin films, interfaces for process optimization • Nanotechnology: Study of nanoparticles, and nanostructures

Instrument Overview

The PHI Genesis XPS offers high-resolution spectroscopy for characterizing the elemental composition, chemical states, and electronic properties of surfaces and thin films.

Technical features and specifications

PHI Genesis XPS provides multiple techniques such as, • Monochromatic Al Kα XPS • Monochromatic Cr Kα HAXPES • Non-monochromatic Mg/Al XPS • UPS: ultra-violet photo electron spectroscopy • AES: Auger electron spectroscopy • REELS: Reflection electron energy loss spectroscopy • GCIB: AR gas cluster ion beam • Flow through high pressure reactor chamber, up to 800°C and 10bar

Charges

NA

Instrument Manufacturer URL

Detailed Specifications

NA