What is it?
08-DRE-PRStrip-NM
Manufacturer: Trymax
Model Name: NEO 2000
Applications: Bulk resist strip / Ashing: Consists in stripping the photoresist. Ashing usually performed after ion implantation or etching. Descum- removing remaining photoresist on wafers for front end fabs
Instrument Overview: Capable to handle 150mm and 200mm diameter substrates; 3 open cassette stations ; cooling station; 5 axis dual arm robot handling, front and rear user-interface; 2 different process chamber technologies available
Technical features and specifications:
Endpoint detection in for stripping.
Capable to handle standard semiconductor substates such as Si, Ge, Glass, SiC wafers .
RF generators power delivery variation within ±5%.
Charges:
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Instrument Manufacturer URL: NA
Detailed Specifications:
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