Etching: CAIBE System (Oxford Ionfab300Plus)

 What is it? 
   A tool for etching Metal, Dielectric, MRAM magnetic layers, hard-to-etch materials.
 
  Manufacturer:  Oxford Instruments
 
  Model Name:  Ionfab300Plus
 
  Applications:  Ion beam etching/ milling
  
  Instrument Overview:  Ion milling system consisting of 1 etching chamber and 1 loadlock chamber equipped with auto handling for wafer transfer. Argon-based etching by physical ion bombardment etch equipped with in-situ SIMS endpoint detection technique. Capable of angled etching for profile control. Wafer Size: From small samples to 8-inch wafer. .

  Technical features and specifications: 
   Materials for etching: Metal, Dielectric, MRAM magnetic layers, hard-to-etch materials
Gases for use: Ar
Endpoint Detection: Yes
Etch Uniformity: <5%

Charges:
   User operated: NA/hour, Staff operated: NA/hour
 
  Instrument Manufacturer URL: https://www.oxinst.com/
 
  Detailed Specifications: 
   https://plasma.oxinst.com/products/ion-beam/ionfab