Etching: ICP-C (Oxford Plasmalab 100 - Cobra)

 What is it? 
   An etching tool that uses chlorine based inductively coupled plasma.
 
  Manufacturer:  Oxford Instrument
 
  Model Name:  Plasmalab100 - Cobra
 
  Applications:   Etching of silicon and III-V compound semiconductors Cryogenic etching of Si Etched III-V semiconductor waveguides with smooth sidewalls Pulsed frequency etching of Si to eliminate footing & undercut  on SOI substrates Bosch process recipe for deep Si etching
  
  Instrument Overview:  Single chamber.
  
  Technical features and specifications: 
   Handles up to 200mm wafer diameter / Process gases: Ar, O2, N2, He, H2, CH4, CF4, CHF3, C4F8, SF6, Cl2, BCl3, HBr / End-point monitoring with optical emission spectrometer (OES) and Laser Interferometry
  Charges:
   User operated: NA, Staff operated: NA
 
  Instrument Manufacturer URL:https://plasma.oxinst.com/
 
  Detailed Specifications: 
   https://plasma.oxinst.com/products/icp-etching/plasmapro-100-cobra-icp