Etching: Xenon Difluoride (XeF2) Vapor Etcher

"What is it?
Isotropic silicon dry etcher.

Manufacturer: XACTIX(KLA)

Model Name: Xetch e1

Applications: The system can typically be used for MEMS applications. XeF2 vapor phase etching exhibits nearly infinite selectively of silicon to photo-resist, silicon dioxide, silicon nitride and aluminium. Being a vapour phase etchant, XeF2 avoids many of problems typically associated with wet process.

Instrument Overview: XeF2 (Xenon Difluoride) is isotropic silicon etching media selective to most other materials. The system can constantly input vaporized XeF2 into reaction chamber and exhaust the etching end product at certain temperature and pressure.

Technical features and specifications:
Process Temperature: 35ºC Capability: Up to 6”wafer Vapour pressure: 3.0

Charges:
NA

Instrument Manufacturer URL: https://www.spts.com/categories/xef2-release-etch

Detailed Specifications:
NA

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