Mechanical processing: Cleaner (Ontrak DSS-200 Series 2)

 What is it? 
   A tool for post CMP cleaning.
 
  Manufacturer:  Ontrak
 
  Model Name:  DSS-200 Series 2
 
  Applications:  Post chemical-mechanical planarization (CMP) cleaner
  
  Instrument Overview:  The system is composed of multiple stations which operate together to achieve processing requirements for wafer cleaning. This include wet and dry cassette stations for automated wafer loading and unloading respectively, 2 brush stations performed on PVA brushes using DIW and a spin station for final DIW rinse followed by a spin dry using heater lamp. .

  Technical features and specifications: 
   For surface particle removal.
Chemicals used: DIW only

Charges:
   User operated: NA/hour, Staff operated: NA/hour
 
  Instrument Manufacturer URL: NA/
 
  Detailed Specifications: 
   NA