Thin film deposition: Cluster PVD System (Singulus Timaris)

 What is it? 
   A Cluster Tool with two Deposition Chambers with 10 targets per chamber; one Etch chamber; One Anneal Chamber. One deposition chamber is for DC power only and the second deposition chamber has both DS and RF power.
 
  Manufacturer:  Singulus
 
  Model Name:  Timaris
 
  Applications:  generally used for MRAM stack deposition
  
  Instrument Overview:  2 Deposition Chambers with 10 targets per chamber; one Etch chamber; One Anneal Chamber. One deposition chamber is for DC power only and the second deposition chamber has both DS and RF power.
  
  Technical features and specifications: 
   Configured to automatically handle standard notched 12-inch Si wafer (but is also able to handle smaller wafers mounted on 12-inch carrier). Capable of multi-stack deposition with pre-sputter cleaning and post sputter annealing capability at 300 deg C.
  Charges:
   User operated: NA/hour, Staff operated: $2100/hour
 
  Instrument Manufacturer URL: https://www.singulus.com/en.html
 
  Detailed Specifications: 
   https://www.singulus.com/uploads/tx_pspublications/Timaris_211114.pdf